@article{aufsatz20459,
    affiliation = {Professur für Halbleitertechnik},
    title = {Remote plasma etching of titanium nitride using NF3/argon and chlorine mixtures for chamber clean applications},
    journal = {Microelectronic Engineering},
    pages = {37--41},
    year = {2007},
    peerreview = {Nein},
    volume = {84},
    doi = {http://},
    author = {Hellriegel, R. and Albert, M. and Hintze, B. and Winzig, H. and Bartha, J.W.}
}