@conference{aufsatz20466,
    affiliation = {Professur für Halbleitertechnik},
    title = {Ternary Ta(Al)N ALD Films using Tantalum Precursors and TMA as additional Reducing Agent},
    journal = {Agent. Proc. AVS ALD Conf., San Diego (US)},
    year = {2007},
    peerreview = {Nein},
    volume = {avail, online},
    doi = {http://},
    author = {D., Schmidt and S., Strehle and M., Albert and S., Teichert and B., Hintze and W., Hentsch and J.W., Bartha}
}