@conference{aufsatz21666,
    affiliation = {Professur für Halbleitertechnik},
    title = {Metalorganic Atomic Layer Deposition of low-resistive and highly conformal Ta-N-C thin films},
    journal = {AVS ALD 2008, 01.7.2008, Brügge, Belgien},
    year = {2008},
    peerreview = {Ja},
    doi = {http://},
    author = {Hoßbach, C. and Schönberger, A. and Teichert, S. and Wilde, L. and Gluch, J. and Menzel, S. and Hintze, B. and Albert, M. and Bartha, J.W.}
}