@article{aufsatz23657,
    affiliation = {Professur für Halbleitertechnik},
    title = {Effect of wet chemical substrate pretreatment on the growth behavior of Ta(N) films deposited by thermal ALD},
    journal = {Microelectronic Engineering},
    keywords = {-},
    pages = {2064--2067},
    year = {2008},
    peerreview = {Ja},
    openaccess = {Nein},
    volume = {85},
    doi = {http://},
    author = {Knaut, M. and Albert, M. and Bartha, J.W. and Schmidt, D. and Schumacher, H. and Strehle, S.}
}