@article{aufsatz26475,
    affiliation = {Professur für Halbleitertechnik},
    title = {Properties of Plasma-Enhanced Atomic Layer Depostion-Grown Tantalum Carbonitrade Thin Films},
    journal = {J. Electrochem. Soc. 156},
    keywords = {ALD},
    year = {2009},
    peerreview = {Ja},
    number = {H852, DOI: 10.1149/1.3205457},
    author = {Hossbach, C. and Teichert, S. and Thomas, J. and Wilde, L. and Wojcik, H. and Schmidt, D. and Adolphi, B. and Bertram, M. and Muhle, U. and Albert, A. and Menzel, S. and Hintze, B. and Bartha, J.W.}
}