@article{aufsatz28752,
    affiliation = {Professur für Mikrosystemtechnik},
    title = {Properties of Plasma-Enhanced Atomic Layer Depostion-Grown Tantalum Carbonitrade Thin Films},
    journal = {J. Electrochem. Soc. 156_11},
    keywords = {ALD, Tantalum Carbonitride thin films},
    pages = {852--859},
    year = {2009},
    peerreview = {Ja},
    author = {Hossbach, C. and Teichert, S. and Thomas, J. and Wilde, L. and Wojcik, H. and Schmidt, D. and Adolphi, B. and Bertram, M. and Mühle, U. and Albert, M. and Menzel, S. and Hintze, B.}
}