@conference{aufsatz32235,
    affiliation = {Professur für Halbleitertechnik},
    title = {Influence of Ionic Strengths and pH-Values of Model-Slurries for Chemical Mechanical Silicon Dioxide Polishing with different Nanodispersed Pure Silica Suspensions},
    journal = {Nanofair 2010, Dresden, 6.-7. Juli 2010},
    keywords = {Chemical Mechanical Silicon Dioxide Polishing},
    year = {2010},
    peerreview = {Nein},
    volume = {Poster},
    author = {Estel, K. and Künzelmann, U. and Bartha, J.W. and Mayer, E.-P. and Barthel, H.}
}