@conference{aufsatz32237,
    affiliation = {Professur für Halbleitertechnik},
    title = {Influence of Ionic Strength and pH-Value on the Silicon Dioxide Polishing Behaviour of Slurries based on Pure Silica Suspensions},
    journal = {Advanced Interconnects and Chemical Mechanical Planarization for Micro- and Nanoelectronics, MRS Spring Meeting 2010, San Francisco, CA, 5. - 7. April 2010},
    keywords = {-},
    pages = {97--102},
    year = {2010},
    peerreview = {Ja},
    volume = {Materials Research Society - Symposium Proceedings, 1249},
    author = {Estel, K. and Künzelmann, U. and Bartha, J.W. and Mayer, E.-P. and Barthel, H.}
}