@conference{aufsatz32239,
    affiliation = {Professur für Halbleitertechnik},
    title = {Comparison of PVD, PECVD & PEALD Ru(-C) films as Cu diffusion barriers by means of bias temperature stress measurements},
    journal = {Microelectronic Engineering, In Press, Corrected Proof, Available online 11 July 2010},
    keywords = {PVD, PECVD, PEALD},
    year = {2010},
    peerreview = {Ja},
    volume = {(MAM 2010 als Poster)},
    author = {Wojcik, H. and Merkel, U. and Jahn, A. and Richter, K. and Junige, M. and Klein, C. and Gluch, J. and Albert, M. and Munnik, F. and Wenzel, C. and Bartha, J.W.}
}