@conference{aufsatz32240,
    affiliation = {Professur für Halbleitertechnik},
    title = {Evaluation of novel Ru-W(-N) films as Cu diffusion barriers for sub 32nm BEOL technology },
    journal = {Nanofair 2010, Dresden},
    keywords = {BEOL technology, Ru-W(-N)},
    year = {2010},
    peerreview = {Nein},
    volume = {Poster},
    author = {Wojcik, H. and Kaltofen, R. and Merkel, U. and Krien, C. and Strehle, S. and Gluch, J. and Knaut, M. and Liske, R. and Wenzel, C. and Bartha, J.W.}
}