@article{aufsatz32245,
affiliation = {Professur für Halbleitertechnik},
title = {Atomic Layer Deposition of Ta-N-Based Thin Films Using a Tantalum Source},
journal = {Journal of The Electrochemical Society},
keywords = {ALD},
pages = {638--642},
year = {2010},
peerreview = {Ja},
volume = {157},
doi = {doi:10.1149/1.3353230},
author = {Schmidt, D. and Knaut, M. and Hossbach, C. and Albert, M. and Hintze, B. and Dussarrat, C. and Bartha, J.W.}
}