@article{aufsatz32258,
    affiliation = {Professur für Halbleitertechnik},
    title = {In Situ Reaction Mechanism Studies on Ozone-Based Atomic Layer Deposition of Al2O3 and HfO2},
    journal = {Applied Materials & Interfaces},
    keywords = {atomic layer deposition, quadrupole mass spectrometry, ozone, in situ, process monitoring, active oxygen},
    pages = {347--350},
    year = {2010},
    peerreview = {Ja},
    volume = {256},
    number = {2},
    doi = {10.1021/am900807a},
    author = {Rose, M. and Niinistö, J. and Endler, I. and Bartha, J.W. and Kücher, P. and Ritala, M.}
}