@article{aufsatz32261,
affiliation = {Professur für Halbleitertechnik},
title = {Resolution and total blur: Correlation and focus dependencies in e-beam lithography},
journal = {J. Vac. Sci. Technol.},
keywords = {e-beam lithography},
pages = {2722--2725},
year = {2009},
peerreview = {Ja},
volume = {B27},
number = {6},
doi = {10.1116/1.3246365},
author = {Keil, K. and Hauptmann, M. and Kretz, J. and Constancias, C. and Pain, L. and Bartha, J.W.}
}