@conference{aufsatz38146,
    affiliation = {Professur für Halbleitertechnik},
    title = {Characterization of ruthenium ALD and PVD thin films for in-situ process control by spectroscopic ellipsometry},
    journal = {6th Workshop Ellipsometry : February 21-24, 2011 Berlin, Germany. Berlin, 2011},
    keywords = {-},
    isbn = {978-3-00-034934-8},
    year = {2011},
    peerreview = {Ja},
    openaccess = {Nein},
    author = {Junige, M. and Knaut, M. and Geidel, M. and Riedel, S. and Endler, I. and Wojcik, H. and Albert, M. and Merkel, U. and Bartha, J.W.}
}