@article{aufsatz38220,
    affiliation = {Professur für Experimentalphysik/Photophysik/Nanooptik},
    title = {Effects of patterning induced stress relaxation in strained SOI/SiGe layers and substrate},
    journal = {J. Appl. Phys.},
    keywords = {RAMAN-SPECTROSCOPY; SILICON STRUCTURES },
    pages = {124513},
    year = {2011},
    peerreview = {Ja},
    openaccess = {Nein},
    volume = {109},
    number = {12},
    doi = {DOI:10.1063/1.3597641 },
    author = {Hermann, P. and Hecker, M. and Renn, F. and Rölke, M. and Kolanek, K. and Rinderknecht, J. and Eng, L. M.}
}