@conference{aufsatz38693,
affiliation = {Professur für Halbleitertechnik},
title = {In situ XPS Investigation of the Chemical Surface Composition during the ALD of ultra-thin Aluminum Oxide Films},
journal = {IEEE 2011 Semiconductor Conference Dresden, September 27 to 28, 2011, Dresden},
keywords = {-},
year = {2011},
peerreview = {Ja},
openaccess = {Nein},
doi = {DOI:10.1109/SCD.2011.6068753},
author = {Geidel, M. and Knaut, M. and Albert, M. and Bartha, J.W.}
}