@conference{aufsatz44176,
    affiliation = {Professur für Halbleitertechnik},
    title = {Densification of Low-Temperature ALD Aluminum Oxide Thin Films by in-situ Flash Annealing},
    journal = {Proceedings of AVS 12th International Conference on Atomic Layer Deposition, June 17 – 20, 2012, Dresden, Germany},
    keywords = {Atomic Layer Deposition, Flash Annealing},
    year = {2012},
    peerreview = {Ja},
    openaccess = {Nein},
    author = {Henke, T. and Hossbach, C. and Knaut, M. and Geidel, M. and Singh, A. and Albert, M. and Bartha, J.W.}
}