@article{aufsatz44246,
    affiliation = {Professur für Halbleitertechnik},
    title = {In-situ analysis on the initial growth of ultra-thin ruthenium films with atomic layer deposition},
    journal = {Microelectronic Engineering},
    keywords = {In-situ XPS, In-vacuo XPS, In-situ AFM, In-vacuo AFM, Initial growth, Initial reaction mechanism, Thermal ALD of Ru, ECPR},
    year = {2012},
    peerreview = {Ja},
    openaccess = {Nein},
    doi = {http://dx.doi.org/10.1016/j.mee.2012.08.026},
    author = {Geidel, M. and Junige, M. and Albert, M. and Bartha, J.W.}
}