@conference{aufsatz44384,
    affiliation = {Professur für Halbleitertechnik},
    title = {High-rate deposition of silicon thin film layers using linear plasma sources operated at very high excitation frequencies (80-140 MHz)},
    journal = {Proceedings of SPIE Optics + Photonics Conference, Thin Film Solar Technology IV, vol. 8470 (2012)},
    keywords = {-},
    year = {2012},
    peerreview = {Ja},
    openaccess = {Nein},
    doi = {doi: 10.1117/12.929265},
    author = {Leszczynska, B. and Strobel, C. and Leszczynski, S. and Albert, M. and Bartha, J.W. and Stephan, U. and Kuske, J.}
}