@conference{aufsatz46382,
    affiliation = {Professur für Halbleitertechnik},
    title = {The Initial Growth of Tantalum Nitride ALD: A Comparative Quantum Chemical and In Situ Experimental Study},
    journal = {12th International Conference on Atomic Layer Deposition AVS-ALD & Baltic ALD 2012: June 18 – 20, 2012, Dresden},
    keywords = {-},
    year = {2012},
    peerreview = {Nein},
    openaccess = {Nein},
    author = {Hossbach, C. and Drees, M. and Seiffert, D. and Strehle, S. and Junige, M. and Albert, M. and Bartha, J.W.}
}