@conference{aufsatz46384,
affiliation = {Professur für Halbleitertechnik},
title = {Low temperature HfO2 and Al2O3 single layer and multilayer structures},
journal = {12th International Conference on Atomic Layer Deposition AVS-ALD & Baltic ALD 2012: June 18 – 20, 2012, Dresden},
keywords = {-},
year = {2012},
peerreview = {Nein},
openaccess = {Nein},
author = {Singh, A. and Hossbach, C. and Hodson, C. and Fang, Qi and Schröder, U. and Mikolajick, T.}
}