@conference{aufsatz52997,
    affiliation = {Professur für Halbleitertechnik},
    title = {Very high deposition rate µc-Si:H absorber layer deposition using a plasma excitation frequency of 140 MHz in combination with high process pressures},
    journal = {Proceedings of 28th European Photovoltaic Solar Energy Conference and Exhibition, Paris, Frankreich, 30.09.-04.10.2013},
    keywords = {-},
    pages = {2573--2579},
    year = {2013},
    peerreview = {Nein},
    openaccess = {Nein},
    author = {Strobel, C. and Merkel, U. and Leszczynska, B. and Leszczynski, S. and Kuske, J. and Albert, M. and Bartha, J.W.}
}