@article{aufsatz53009,
    affiliation = {Professur für Halbleitertechnik},
    title = {In-situ analysis on the initial growth of ultra-thin ruthenium films with atomic layer deposition},
    journal = {Microelectronic Engineering},
    keywords = {In-situ XPS, In-vacuo XPS, In-situ AFM, In-vacuo AFM, Initial growth, Initial reaction mechanism, Thermal ALD of Ru, ECPR},
    pages = {151--155},
    year = {2013},
    peerreview = {Ja},
    openaccess = {Nein},
    volume = {107},
    doi = {10.1016/j.mee.2012.08.026 },
    author = {Geidel, M. and Junige, M. and Albert, M. and Bartha, J.W.}
}