@article{aufsatz57147,
    affiliation = {Professur für Halbleitertechnik},
    title = {Atomic layer deposited high-κ nanolaminates for silicon surface passivation },
    journal = {Journal of Vacuum Science & Technolgy, B},
    keywords = {-},
    pages = {03D110--03D110-6},
    year = {2014},
    peerreview = {Ja},
    openaccess = {Ja},
    volume = {32},
    number = {3},
    doi = {http://dx.doi.org/10.1116/1.4863499},
    author = {Benner, F. and Jordan, Paul M. and Richter, C. and Simon, Daniel K. and Dirnstorfer, I. and Knaut, M. and Bartha, J. W. and Mikolajick, T.}
}