@article{aufsatz57149,
    affiliation = {Professur für Halbleitertechnik},
    title = {Modification of Ultra Low-k Dielectric Films by O2 and CO2 Plasmas },
    journal = {ECS J. Solid State Sci. Technol. 01/2014},
    keywords = {-},
    pages = {N3048--N3057},
    year = {2015},
    peerreview = {Ja},
    openaccess = {Ja},
    volume = {4},
    doi = {10.1149/2.0061501jss },
    author = {Olawumi, T. and Levrau, E. and Krishtab, M. and Detavernier, C. and Bartha, J. W. and Xu, K. and Lazzarino, F. and Baklanov, M. R.}
}