@article{aufsatz57426,
    affiliation = {Professur für Halbleitertechnik},
    title = {Evaluation of direct patternable inorganic spin-on hard mask materials using electron beam lithography},
    journal = {Microelectronic engineering 98},
    keywords = {Inorganic resist, E-beam direct write, Direct patterned spin on hard mask, High resolution, 22 nm SRAM},
    pages = {226--229},
    issn = {0167-9317},
    year = {2012},
    peerreview = {Ja},
    openaccess = {Nein},
    volume = {98},
    doi = {doi:10.1016/j.mee.2012.07.017},
    author = {Thrun, X. and Choj, K.-H. and Freitag, M. and Grenville, A. and Gutsch, M. and Hohle, C. and Stowers, J. K. and Bartha, J. W.}
}