@article{aufsatz57833,
    affiliation = {Professur für Halbleitertechnik},
    title = {Pattern transfer from the e-beam resist, over the nanoimprint resist and to the final silicon substrate},
    journal = {Proc. SPIE 8328, Advanced Etch Technology for Nanopatterning, 83280S (17 March 2012)},
    keywords = {Pattern transfer, RIE, smooth tapered sidewall, nanoimprint lithography},
    year = {2012},
    peerreview = {Ja},
    openaccess = {Nein},
    doi = {doi:10.1117/12.916285},
    author = {He, J. and Howitz, S. and Richter, K. and Bartha, J. W. and Moench, J. I.}
}