@conference{aufsatz57849,
    affiliation = {Professur für Halbleitertechnik},
    title = {Comparative study on ALD/CVD-Co(W) films as a single barrier/liner layer for 22−1x nm generation interconnects },
    journal = { Interconnect Technology Conference (IITC), 2012 IEEE International, San Jose, CA, 4-6 June 2012 },
    keywords = {-},
    pages = {1--3},
    isbn = {978-1-4673-1138-0},
    year = {2012},
    peerreview = {Ja},
    openaccess = {Ja},
    doi = {http://dx.doi.org/10.1109/IITC.2012.6251657},
    author = {Shimizu, H. and Woijcik, H. and Shima, K. and Kobayashi, Y. and Momose, T. and Bartha, J. W. and Shimogaki, Y.}
}