@conference{aufsatz69170,
    affiliation = {Professur für Halbleitertechnik},
    title = {Experimental and simulative approach for process optimization of atomic layer deposited thin films in high aspect ratio 3D structures},
    journal = {16th AVS conference on Atomic Layer Deposition, Dublin, Ireland},
    keywords = {ALD, Al2O3, MEMS, 3D, high aspect ratio, film growth, simulation},
    year = {2016},
    peerreview = {Nein},
    openaccess = {Nein},
    author = {Schwille, M. and Schön, F. and Knaut, M. and Bartha, J.W.}
}