@article{aufsatz69957,
    affiliation = {Professur für Halbleitertechnik},
    title = {Growth of aluminum oxide thin films with enhanced film density by the integration of in situ flash annealing into low-temperature atomic layer deposition },
    journal = {Surface & Coatings Technology},
    keywords = {Aluminum oxide (Al2O3), Atomic layer deposition (ALD), Flash lamp annealing (FLA), Low-temperature deposition, Enhanced film density, Enhanced film growth},
    pages = {600--608},
    year = {2017},
    peerreview = {Ja},
    openaccess = {Nein},
    volume = {309},
    doi = {10.1016/j.surfcoat.2016.11.048},
    author = {Henke, T. and Knaut, M. and Hossbach, C. and Geidel, M. and Albert, M. and Bartha, J.W.}
}