@article{aufsatz71511,
    affiliation = {Professur für Halbleitertechnik},
    title = {Atomic Layer Deposition for Coating of High Aspect Ratio TiO2 Nanotube Layers},
    journal = {Langmuir, 2016, 32 (41)},
    keywords = {ALD, Al2O3, porous materials, nanotubes, film growth, high aspect ratio},
    pages = {10551--10558},
    year = {2016},
    peerreview = {Ja},
    openaccess = {Nein},
    doi = {10.1021/acs.langmuir.6b03119},
    author = {Zazpe, R. and Knaut, M. and Sopha, H. and Hromadko, L. and Albert, M. and Prikryl, J. and Gärtnerová, V. and Bartha, J.W. and Macak, Jan M.}
}