@article{aufsatz71512,
affiliation = {Professur für Halbleitertechnik},
title = {Experimental and simulation approach for process optimization of atomic layer deposited thin films in high aspect ratio 3D structures },
journal = {Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 35, 01B118 },
keywords = {-},
year = {2017},
peerreview = {Ja},
openaccess = {Nein},
doi = {10.1116/1.4971196},
author = {Schwille, M. C. and Schössler, T. and Barth, J. and Knaut, M. and Schön, F. and Höchst, A. and Oettel, M. and Bartha, J.W.}
}