@conference{aufsatz71521,
    affiliation = {Professur für Halbleitertechnik},
    title = {Area-selective Atomic Layer Deposition of Ruthenium upon Focused Electron Beam Induced Deposition Platinum patterns versus Silicon Dioxide substrate},
    journal = {Area Selective Deposition workshop "ASD 2016" : April 15th, 2016, at imec in Leuven, Belgium. Leuven, 2016 },
    keywords = {-},
    year = {2016},
    peerreview = {Nein},
    openaccess = {Nein},
    author = {Junige, M. and Löffler, M. and Geidel, M. and Albert, M. and Bartha, J.W. and Zschech, E. and van Dorp, Willem F.}
}