@conference{aufsatz71553,
    affiliation = {Professur für Halbleitertechnik},
    title = {SEM Based Overlay - development of dedicated workflow using new imaging capability on CD-SEM for inline process control within Semiconductor manufacturing environment.},
    journal = {Conference: 16TH EUROPEAN ADVANCED PROCESS CONTROL AND MANUFACTURING (APC|M) CONFERENCE, At Reutlingen (Stuttgart), GERMANY},
    keywords = {-},
    year = {2016},
    peerreview = {Nein},
    openaccess = {Ja},
    author = {Millat, S. and Hoeft, J. T. and Bartha, J.W.}
}