@article{aufsatz71557,
affiliation = {Professur für Halbleitertechnik},
title = {Sensitivity analysis for high accuracy proximity effect correction },
journal = {Proc. SPIE 9635, Photomask Technology 2015, 963515 (October 23, 2015)},
keywords = {sensitivity analysis, point spread function, proximity eect correction, electron beam lithography, data preparation},
year = {2015},
peerreview = {Ja},
openaccess = {Nein},
doi = {10.1117/12.2197175},
author = {Thrun, X. and Browning, C. and Choi, K.-H. and Figueiro, T. and Hohle, C. and Saib, M. and Schlavone, P. and Bartha, J.W.}
}