@article{aufsatz71557,
    affiliation = {Professur für Halbleitertechnik},
    title = {Sensitivity analysis for high accuracy proximity effect correction },
    journal = {Proc. SPIE 9635, Photomask Technology 2015, 963515 (October 23, 2015)},
    keywords = {sensitivity analysis, point spread function, proximity eect correction, electron beam lithography, data preparation},
    year = {2015},
    peerreview = {Ja},
    openaccess = {Nein},
    doi = {10.1117/12.2197175},
    author = {Thrun, X. and Browning, C. and Choi, K.-H. and Figueiro, T. and Hohle, C. and Saib, M. and Schlavone, P. and Bartha, J.W.}
}