@article{aufsatz71559,
    affiliation = {Professur für Halbleitertechnik},
    title = {Breakdown and Protection of ALD Moisture Barrier Thin Films},
    journal = {ACS Appl. Mater. Interfaces, 2015, 7 (40)},
    keywords = {atomic layer deposition; barrier; corrosion; encapsulation; water vapor; WVTR},
    pages = { 22121--22127},
    year = {2015},
    peerreview = {Ja},
    openaccess = {Nein},
    doi = {10.1021/acsami.5b06891},
    author = {Nehm, F. and Klumbies, H. and Richter, C. and Singh, A. and Schroeder, U. and Mikolajick, T. and Mönch, T. and Hossbach, C. and Albert, M. and Bartha, J.W. and Leo, K. and Müller-Meskamp, L.}
}