@conference{aufsatz73871,
    affiliation = {Professur für Halbleitertechnik},
    title = {HfO2 ALD – A process development with in situ quartz crystal microbalances},
    journal = {15th AVS conference on Atomic Layer Deposition, Portland, OR, USA},
    keywords = {ALD, QCM, in-situ, HfO2, process development},
    year = {2015},
    peerreview = {Ja},
    openaccess = {Nein},
    author = {Knaut, M. and Albert, M.}
}