@article{aufsatz81917,
    affiliation = {Professur für Optoelektronik},
    title = {INTEGRATION OF WET-CHEMICAL PROCESSING WITH LOW-TEMPERATURE PLASMA-ASSISTED PROCESSES FOR THE FORMATION OF DEVICE-QUALITY SI/SIO2 INTERFACES ON SI(111) SURFACES},
    journal = {MICROELECTRONIC ENGINEERING},
    pages = {217--222},
    issn = {0167-9317},
    year = {1994},
    peerreview = {Nein},
    volume = {25},
    number = {2-4},
    doi = {doi:10.1016/0167-9317(94)90018-3},
    author = {YASUDA, T and BJORKMAN, CH and MA, Y and LU, Z and LUCOVSKY, G and EMMERICHS, U and MEYER, C and LEO, K and KURZ, H}
}