@article{aufsatz81932,
    affiliation = {Professur für Optoelektronik},
    title = {EFFECTS OF THIN-FILM DEPOSITION RATES, AND PROCESS-INDUCED INTERFACIAL LAYERS ON THE OPTICAL-PROPERTIES OF PLASMA-DEPOSITED SIO2/SI3N4 BRAGG REFLECTORS},
    journal = {JOURNAL OF VACUUM SCIENCE \& TECHNOLOGY A-VACUUM SURFACES AND FILMS},
    pages = {893--899},
    issn = {0734-2101},
    year = {1993},
    peerreview = {Nein},
    volume = {11},
    number = {4, 1},
    doi = {doi:10.1116/1.578323},
    author = {STEPHENS, DJ and HE, SS and LUCOVSKY, G and MIKKELSEN, H and LEO, K and KURZ, H}
}